The dust blocking efficiency of a mask is based on its blocking efficiency against fine dust, especially respirable dust below 2.5 microns.
Because dust of this size can directly enter the alveoli, it will have serious consequences for human health.
The PTFE nanomask filter membrane made by the Suzhou PTFE filter membrane manufacturer through mechanical stretching of PTFE material can ensure the complete retention of bacteria and other impurities while having a large flux.
The material is resistant to high temperatures, strong acids and alkali, and has wide chemical applicability. When used for gas filtration, it can achieve 100% retention of various phages, bacteria and particles above 0.02um.
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